Librería Samer Atenea
Librería Aciertas (Toledo)
Kálamo Books
Librería Perelló (Valencia)
Librería Elías (Asturias)
Donde los libros
Librería Kolima (Madrid)
Librería Proteo (Málaga)
The microlithographic process, essential in the fabrication of microdevices, uses high-energy radiation to transfer a pattern onto a thin film of polymer resist. Pattern transfer occurs by modifying the properties (solubility or volatility) of the polymer film exposed to radiation. Poly(olefin sulfones) exhibit a high sensitivity to x-rays, which is a desirable property for polymer resists used in the microlithographic process. The potential utility of these new resins prompted a study of the mechanism of degradation promoted by x-ray radiation. In this study, the effect of x-ray radiation on polysulfones with varied chemical structures was analyzed using x-ray absorption near-edge structure (XANES) spectroscopy and in-situ mass spectroscopy (MS). Interesting differences in the mode of degradation of certain poly(olefin sulfones) was observed. The results provide important groundwork for further studies of polysulfones as x-ray resists.