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Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Oluwatobi Adeleke / Sina Karimzadeh / Tien-Chien Jen

94,29 €
IVA incluido
Disponible
Editorial:
Taylor & Francis Ltd
Año de edición:
2025
Materia
Química industrial
ISBN:
9781032386737
94,29 €
IVA incluido
Disponible

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Sobre IBD

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

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