Ion Implantation and Synthesis of Materials

Ion Implantation and Synthesis of Materials

James W. Mayer / Michael Nastasi

170,86 €
IVA incluido
Disponible
Editorial:
Springer Nature B.V.
Año de edición:
2010
ISBN:
9783642062599
170,86 €
IVA incluido
Disponible

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Sobre IBD

General Features and Fundamental Concepts.- Particle Interactions.- Dynamics of Binary Elastic Collisions.- Cross-Section.- Ion Stopping.- Ion Range and Range Distribution.- Displacements and Radiation Damage.- Channeling.- Doping, Diffusion and Defects in Ion-Implanted Si.- Crystallization and Regrowth of Amorphous Si.- Si Slicing and Layer Transfer: Ion-Cut.- Surface Erosion During Implantation: Sputtering.- Ion-Induced Atomic Intermixing at the Interface: Ion Beam Mixing.- Application of Ion Implantation Techniques in CMOS Fabrication.- Ion implantation in CMOS Technology: Machine Challenges.

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