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Germanium Surface Preparation Methods

Germanium Surface Preparation Methods

Jungyup Kim

60,55 €
IVA incluido
Disponible
Editorial:
KS OmniScriptum Publishing
Año de edición:
2008
Materia
Ingeniería: general
ISBN:
9783836484114
60,55 €
IVA incluido
Disponible

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Sobre IBD

Germanium is gaining interest in the semiconductor industry as a replacement channel material for high mobility applications. Con­tamination directly affects the device performance, yield and reliability. Therefore, continued device scaling is dependent on effective surface preparation including effective contamination and particle removal of germanium surface. Cleaning and preparation methods for silicon surface have been extensively developed over the past few decades. Germanium surface cleaning and preparation is at its infancy and is markedly different from that of silicon.This book examines these differences and fundamentals involved in germanium surface cleaning. This book also proposes methods for basic germanium surface cleaning and the basis for further process develop­ment for professionals involved in surface cleaning of semiconductor materials.

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