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Estudo da camada superficial do silício com revestimento de índio

Estudo da camada superficial do silício com revestimento de índio

Grechikhin Leonid Ivanovich / Yulia Shmermbek

35,94 €
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Editorial:
KS OmniScriptum Publishing
Año de edición:
2025
Materia
Empresa y gestión
ISBN:
9786202210980
35,94 €
IVA incluido
Disponible

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O trabalho refere-se à área de nanotecnologia, que tem se desenvolvido rapidamente nas últimas décadas. Muitos aspetos ainda permanecem obscuros e requerem um estudo mais aprofundado. O trabalho proposto contém uma análise das regularidades da formação de elementos de reconstrução e estruturas de clusters nas superfícies Si(111) e Si(557). Foram estudadas as características do surgimento da reconstrução 7x7 na superfície vicinal Si(557). Verificou-se que o início da formação de aglomerados na superfície Si(557), ao contrário da superfície Si(111), não começa imediatamente com o início da pulverização. O atraso é de até 20% do tempo total de pulverização da monocamada. Durante esse atraso, os átomos de índio se depositam nos degraus, formando zonas de revestimento não estruturado de índio. Foi feita uma tentativa de explicar a razão da formação de reconstruções tão complexas, como 7x7 ou 5x5. Foi formulada uma versão da criação da metodologia STMS - digitalização simultânea do relevo da superfície e remoção das dependências espectroscópicas.

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