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Chemical Vapor Deposition Polymerization

Chemical Vapor Deposition Polymerization

Jeffrey B. Fortin / Toh-Ming Lu

133,36 €
IVA incluido
Disponible
Editorial:
Springer Nature B.V.
Año de edición:
2003
Materia
Química industrial
ISBN:
9781402076886
133,36 €
IVA incluido
Disponible

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Sobre IBD

Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system’s pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

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