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Transmission Electron Microscopy of Semiconductor Nanostructures

Transmission Electron Microscopy of Semiconductor Nanostructures

Andreas Rosenauer

68,52 €
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Editorial:
Springer Nature B.V.
Año de edición:
2013
Materia
Medicina: cuestiones generales
ISBN:
9783662146187
68,52 €
IVA incluido
Disponible

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The high perfection of crystal growth techniques, for example niolecular beam epitaxy (MBE) and the different variants of chelrlical vapor deposition (CVD), allow the growth of low dimensional semiconductor heterostructures, which are one of the main research topics in solid state physics at present. Thin layers or dots of sphalerite type compound semiconductors such as A1,Gal ,As, In,Gal ,As and Cd,Znl ,Se are used in the fabrication of optoelectronic devices such as light emitting diodes and laser diodes. The optical and electronic properties of such devices are strongly influenced by the local variation of the composition x because it affects the positions and spacings of the discrete energy levels of charge carriers in quantum wells and dots. However, there is a lack of basic understanding of the growth processes, in particular for the three dimensional growth modes, where isolated islands are nucleated on a continuous wetting layer covering the substrate (Stranski Krastanov growth mode) or directly on the substrate (Volmer Weber growth mode). The three dimensional growth modes are used to obtain self orga nized nanostructures, referred to as 'quantum dots'. The optical and elec tronic properties are being studied intensively by many groups; correlation of these properties with the structural and compositional properties is required. In this context, effects such as segregation, interdiffusion and strain driven adatom migration must be investigated with an atomic scale spatial resolu tion.

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