Next Generation Assembly Fabrication Methods

Next Generation Assembly Fabrication Methods

Vincent T. Jovene

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Editorial:
BiblioScholar
Año de edición:
2012
ISBN:
9781249601319
17,08 €
IVA incluido
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Today, the continued success of many industries, especially the microelectronics industry, relies upon the ability to fabricate structures with nanometer precision. The efforts toward developing nanometer scale fabrication methods fall loosely into two fields. One field seeks to extend the current planar, deposit-pattern-etch paradigm used for complementary metal oxide semiconductors (CMOS). This is a top-down approach. The other seeks new techniques to assemble structures without handling individual particles-self-assembly. These techniques take a bottom-up approach. 'We are beginning to reach the fundamental limits of the materials used in the planar CMOS process, the process that has been the basis for the semiconductor industry for the past 30 years.'2 This is driving industry to fund research to find ways to continue 'Moore’s Law' - doubling the number of transistors on a chip every two years - with new fabrication methods. The thesis of this paper is that as new fabrication methods are mastered in the quest to continue Moore’s Law, these techniques will propagate to other applications with the potential to threaten US national security interests. This paper seeks to prove the thesis with a technology trend forecast in the field of nanoscience focused on self-assembled devices. It identifies a trend, tracks the development of a technology, then forecasts applications, implications, and makes recommendations.This work has been selected by scholars as being culturally important, and is part of the knowledge base of civilization as we know it. This work was reproduced from the original artifact, and remains as true to the original work as possible. Therefore, you will see the original copyright references, library stamps (as most of these works have been housed in our most important libraries around the world), and other notations in the work.This work is in the public domain in the United States of America, and possibly other nations. Within the United States, you may freely copy and distribute this work, as no entity (individual or corporate) has a copyright on the body of the work.As a reproduction of a historical artifact, this work may contain missing or blurred pages, poor pictures, errant marks, etc. Scholars believe, and we concur, that this work is important enough to be preserved, reproduced, and made generally available to the public. We appreciate your support of the preservation process, and thank you for being an important part of keeping this knowledge alive and relevant.

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