Handbook of Photomask Manufacturing Technology

Handbook of Photomask Manufacturing Technology

Syed Rizvi

502,89 €
IVA incluido
Consulta disponibilidad
Editorial:
Taylor & Francis Ltd
Año de edición:
2005
ISBN:
9780824753740

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As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it is increasingly important for new technologies to keep pace with these demands. Photomask technology is one of the key areas to achieving this goal. This valuable reference provides a comprehensive summary of all areas of mask technology in a single work, featuring contributions from 40 internationally reputable authors from industry, academia, government, national labs, and consortia. They discuss conventional masks and their supporting technologies, as well as next-generation technologies such as extreme ultraviolet, electron projection, ion projection, and X-ray lithography.

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