LIBROS DEL AUTOR: m k zuraw

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  • Principles of Chemical Vapor Deposition
    Daniel Dobkin / M.K. Zuraw
    Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical ...
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    269,19 €