LIBROS DEL AUTOR: jack c lee

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  • Hf-Based High-k Dielectrics
    Jack C. Lee / Young-Hee Kim
    In this work, the reliability of HfO2 (hafnium oxide) with poly gate and dual metal gate electrode (Ru-Ta alloy, Ru) was investigated. Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. Dynamic stressing has also been used. It was found that the combination of trapping and detrapping contributed to the enhancement of ...
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